	Innovative Measurement Solutions Omniscan
HOME APPLICATIONS -Nanoscale surface science -Nanoscale topography -Microscale topography -Flatness/Waviness -Thin-film characterisation -Surface manipulation PRODUCTS -DualScope -MicroXAM -MiniFIZ -OSP100/500 -Alpha-Step/P-16+ -nkd7000/8000 -uPG101/DWL66 TECHNOLOGIES - SP M - White light interferometry - Laser interferometry - Laser/confocal scanning - Stylus profiling - Spectrophotometry - Laser lithography CONTACT Click on one of the above	nkd7000 – complete thin-film and layer characterisation system. The nkd-7000 provides a unique, integrated desk top solution for all your thin film measurement needs. Non-destructive determination of refractive index (n), extinction coefficient (k) and film thickness measurement (d), of single and multi-layer thin films and substrates is achieved using the combined measurement of Transmittance and Reflectance – simultaneously. No sample preparation is required and samples are mounted on a horizontal x y platform for ease of handling and access. A range of sample platform options are available for use with thin, flexible substrates or thick, heavy slabs of material. We even have temperature-controlled and XY-stepping stages for automatic film thickness and index mapping of sample surfaces. Simultaneous tranmission AND reflection measurements give complete characterisation. Spectra for thin film analysis, may be measured using polarised (s- and p-) or unpolarised light, at one or three fixed angles of incidence and over a wide spectral range. These can be standard or user defined angles, (see the nkd8000 for continuously variable angles of incidence). Thickness and optical parameter mapping with the nkd8000. Full data capture and film analysis takes only 15 minutes and the powerful Pro-Optix™ control software makes the whole process of measuring film thickness and determining optical properties fast and simple.

Innovative Measurement Solutions

Omniscan

APPLICATIONS
-Nanoscale surface science
-Nanoscale topography
-Microscale topography
-Flatness/Waviness
-Thin-film characterisation
-Surface manipulation

PRODUCTS
-DualScope
-MicroXAM
-MiniFIZ
-OSP100/500
-Alpha-Step/P-16+
-nkd7000/8000
-uPG101/DWL66

TECHNOLOGIES
- SP M
- White light interferometry
- Laser interferometry
- Laser/confocal scanning
- Stylus profiling
- Spectrophotometry
- Laser lithography

CONTACT

Click on one of the above

nkd7000 – complete thin-film and layer characterisation system.

The nkd-7000 provides a unique, integrated desk top solution for all your thin film measurement needs. Non-destructive determination of refractive index (n), extinction coefficient (k) and film thickness measurement (d), of single and multi-layer thin films and substrates is achieved using the combined measurement of Transmittance and Reflectance – simultaneously.

No sample preparation is required and samples are mounted on a horizontal x y platform for ease of handling and access. A range of sample platform options are available for use with thin, flexible substrates or thick, heavy slabs of material. We even have temperature-controlled and XY-stepping stages for automatic film thickness and index mapping of sample surfaces.

Simultaneous tranmission AND reflection measurements give complete characterisation.

Spectra for thin film analysis, may be measured using polarised (s- and p-) or unpolarised light, at one or three fixed angles of incidence and over a wide spectral range. These can be standard or user defined angles, (see the nkd8000 for continuously variable angles of incidence).

Thickness and optical parameter mapping with the nkd8000.

Full data capture and film analysis takes only 15 minutes and the powerful Pro-Optix™ control software makes the whole process of measuring film thickness and determining optical properties fast and simple.