	Innovative Measurement Solutions Omniscan
HOME APPLICATIONS -Nanoscale surface science -Nanoscale topography -Microscale topography -Flatness/Waviness -Thin-film characterisation -Surface manipulation PRODUCTS -DualScope -MicroXAM -MiniFIZ -OSP100/500 -Alpha-Step/P-16+ -nkd7000/8000 -uPG101/DWL66 TECHNOLOGIES - SP M - White light interferometry - Laser interferometry - Laser/confocal scanning - Stylus profiling - Spectrophotometry - Laser lithography CONTACT Click on one of the above	Laser Lithography and Direct Surface Writing systems. Heidelberg Instruments are a world leader in design, development and manufacturing of Laser Lithography systems, for photomask making and direct writing. Applications include: Micro and Nano technology, MEMS, Flat Panel Displays, BGA, ASICS, TFT, Plasma Displays, Micro Optics, and many other related fields. The µPG101 Table Top Maskless Lithography System: This is an extremely economical and easy to use Micro Pattern Generator for direct writing applications and low volume mask making. It is also perfectly suitable for rapid prototyping of 2D and 3D microstructures on substrates up to 4 inches square, for features down to the micron level. This tabletop system offers a very small footprint and can be placed on virtually any desk. It presents a highly flexible tool for the creation of microstructures and can even be used for inspection purposes with the integrated camera system. Applications include MEMS, BioMEMS, Integrated Optics, Micro Fluidics, µTAS, or any other application that requires microstructures. The DWL66 High Accuracy maskless lithography system: is an economical, high resolution direct write pattern generator for low volume mask making and direct writing which can accommodate substrate sizes up to 200 mm by 200 mm and can expose features down to the sub-micron level. Possible options include: Metrology Layer to Layer Alignment Front to Back Side Alignment Grey Scale exposure Applications include: MEMS, Integrated Optics, ASICs, MCMs, Micro Fluidics, Sensors, along with other exciting areas. Mask procuction - ball grid array and wafer mask. Direct surface writing – grey scale or multi-step. The DWL66 customer base includes over 80 leading universities and research institutions world wide.

Innovative Measurement Solutions

Omniscan

APPLICATIONS
-Nanoscale surface science
-Nanoscale topography
-Microscale topography
-Flatness/Waviness
-Thin-film characterisation
-Surface manipulation

PRODUCTS
-DualScope
-MicroXAM
-MiniFIZ
-OSP100/500
-Alpha-Step/P-16+
-nkd7000/8000
-uPG101/DWL66

TECHNOLOGIES
- SP M
- White light interferometry
- Laser interferometry
- Laser/confocal scanning
- Stylus profiling
- Spectrophotometry
- Laser lithography

CONTACT

Click on one of the above

Laser Lithography and Direct Surface Writing systems.

Heidelberg Instruments are a world leader in design, development and manufacturing of Laser Lithography systems, for photomask making and direct writing. Applications include: Micro and Nano technology, MEMS, Flat Panel Displays, BGA, ASICS, TFT, Plasma Displays, Micro Optics, and many other related fields.

The µPG101 Table Top Maskless Lithography System:
This is an extremely economical and easy to use Micro Pattern Generator for direct writing applications and low volume mask making. It is also perfectly suitable for rapid prototyping of 2D and 3D microstructures on substrates up to 4 inches square, for features down to the micron level.

This tabletop system offers a very small footprint and can be placed on virtually any desk. It presents a highly flexible tool for the creation of microstructures and can even be used for inspection purposes with the integrated camera system. Applications include MEMS, BioMEMS, Integrated Optics, Micro Fluidics, µTAS, or any other application that requires microstructures.

The DWL66 High Accuracy maskless lithography system:
is an economical, high resolution direct write pattern generator for low volume mask making and direct writing which can accommodate substrate sizes up to 200 mm by 200 mm and can expose features down to the sub-micron level.

Possible options include:

Metrology
Layer to Layer Alignment
Front to Back Side Alignment
Grey Scale exposure

Applications include: MEMS, Integrated Optics, ASICs, MCMs, Micro Fluidics, Sensors, along with other exciting areas.

Mask procuction - ball grid array and wafer mask.

Direct surface writing – grey scale or multi-step.

The DWL66 customer base includes over 80 leading universities and research institutions world wide.